Candi™ liquid precursor delivery system

For the continuous reliable distribution of advanced liquid precursors

Transfer precursors from shuttle canisters to your point-of-use maintaining precise, ultra-pure, and continuous delivery

The Candi™ range is applicable to the fields of atomic layer deposition (ALD), chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVPD). It allows liquid precursors distribution for:
  • Direct liquid injection (DLI)
  • On-board bubblers
  • Vaporizers and on-board buffer canisters.

Candi™ key benefits

Maximal uptime and chemical utilization

  • Patented back-up distribution mode ensures continuous dispense during canister change-out.
  • Smart Empty Control allows for maximal chemical usage, minimizing waste and reducing overall cost of ownership.
  • Proven 99.99% uptime and MTBF > 15,000 hours reliability.

Advanced safety features

  • Patented purge sequence using gas compression/expansion ensures safe, contamination-free canister change-out.
  • Integrated liquid trap protects the vent line from chemical release.
  • Fully automatic distribution sequences and critical functions protected by multi-level password access.

Candi™ Standard

Features an internal day tank for continuous distribution at a steady pressure during shuttle canister change-out.

  • Candi Lite: Dedicated for research and R&D.
  • Pyrophoric Version: Includes enhanced safety features like fire sensors and automatic exhaust dampers.

Candi™ Bulk 

Designed for high-volume use, it supports large shuttle containers (up to 200 L) and has a bigger day tank for increased capacity. A pyrophoric version is available.

Candi™ Solvent

Employs a solvent cleaning technique to handle precursors with low vapor pressure, accelerating the necessary purge cycles prior to canister replacement.

Candi™ Bubbler

Provides gaseous distribution to saturate by bubbling a carrier gas such as Helium or Nitrogen with liquid precursor and distributing it at a steady concentration and pressure to a Point-of-Use (POU).

Frequently Asked Questions (FAQ)

How does the CANDI™ Liquid Delivery System ensure maximum uptime and chemical utilization?

The system achieves proven 99.99% uptime and an MTBF > 15,000 hours. It utilizes a patented back-up distribution mode and Smart Empty Control to ensure continuous dispense and maximal chemical usage, minimizing waste and overall cost of ownership.

What advanced safety features are integrated into the CANDI™ precursor delivery solution?

CANDI™ prioritizes safety with a patented purge sequence using gas compression/expansion for safe, contamination-free canister change-out. It also includes an integrated liquid trap and fully automatic distribution sequences protected by multi-level password access.

Is there a CANDI™ solution for managing highly viscous or pyrophoric liquid precursors?

Yes. The CANDI™ Fusion variant is engineered with an integrated thermal management system and a proprietary solvent-based cleaning protocol to ensure the safe handling of solid and high-viscosity precursors. Dedicated Pyrophoric Versions of CANDI™ standard and CANDI™ Bulk are also available with enhanced safety features like fire sensors.

Candi™ is qualified by major Original Equipment Manufacturers (OEMs) for 300-mm production, ensuring high performance, safety, and cost efficiency in demanding applications like Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), and Plasma-Enhanced CVD (PECVD).

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