ULTRAL H₂: High Grade Hydrogen Production Unit
On-site cryogenic purifiers engineered to deliver ultra-high purity hydrogen with sub-ppb impurity levels. Meeting the stringent requirements for advanced semiconductor and optoelectronic manufacturing.
Ultra-pure hydrogen for advanced electronics
The manufacturing of advanced semiconductor components and optoelectronics requires process and vector gases of absolute, verifiable purity. The ULTRAL H2 product line provides a highly reliable on-site solution by purifying standard industrial-grade feedstock into an ultra-pure gas. By guaranteeing sub-ppb impurity levels, this technology is critical for sensitive fabrication steps, such as silicon epitaxy, annealing and passivation, EUV lithography clean-up and plasma etching & deposition ensuring maximum yield and flawless performance for the electronics industry.
Designed as a highly practical alternative to traditional Getter-type purifiers for continuous industrial production, the ULTRAL H2 offers some of the lowest operating costs available on the market.
- Unmatched sub-ppb purity: it achieves less than 1 ppb for critical impurities including nitrogen (N2), oxygen (O2), methane (CH4), carbon dioxide (CO2), water (H2O), and carbon monoxide (CO) and up to 10 ppb level for the Argon (Ar) critical impurity
- Low operating costs: The system is energy-efficient, consuming a minimal 5 to 60 L/h of liquid nitrogen (LN2) during purification phase.
- Extreme operational flexibility: Capable of handling substantial variations in flow rate (from 20 up to 1,000 Nm3/h) and handling fluctuating impurity concentrations without ever compromising the ultra-pure output.
- Proven longevity & compact footprint: Operating at TRL 9, the system boasts a lifetime exceeding 30 years while maintaining a highly compact design (the largest model measures just 2 m x 4 m x 4 m).
A zero-waste alternative
Traditional gas purification often relies on consumable cartridges that require frequent, costly replacements and generate hazardous waste. The ULTRAL H2 eliminates these issues entirely.
By utilizing a cryogenic adsorption process with a twin-column architecture, the system operates continuously (24/7). While one column actively purifies the hydrogen, the second column automatically regenerates. This self-sustaining cycle drastically reduces maintenance downtime, eliminates consumable waste, and ensures an uninterrupted supply of ultra-pure gas.
Frequently Asked Questions
What is the main difference between ULTRAL H₂ and Getter purifiers?
Unlike Getter purifiers that rely on chemical consumption and require regular, costly cartridge replacements, the ULTRAL H2 uses cryogenic adsorption. Its twin-column design automatically regenerates itself, resulting in zero consumable waste, significantly lower OPEX, and truly continuous 24/7 operation.
Can the system handle fluctuating hydrogen demands?
Yes. The ULTRAL H2 is designed with extreme operational flexibility, allowing it to seamlessly manage flow rate variations from 20 up to 1,000 Nm3/h without ever compromising the sub-ppb purity of the output gas.
What specific impurities does the ULTRAL H₂ remove?
The system effectively traps and removes all major contaminants to sub-ppb levels (< 1 ppb), including nitrogen (N2), oxygen (O2), methane (CH4), carbon dioxide (CO2), water (H2O), and carbon monoxide (CO), and up to 10 ppb level for the Argon (Ar) critical impurity.
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